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Material

Aluminum

The original interconnect metal — easy to deposit and etch, still used for certain layers, bond pads, and robust designs.

In short

Aluminum was the standard interconnect metal for decades because it conducts well, adheres to silicon dioxide, and can be deposited and etched with straightforward processes. Copper has replaced it for dense high-performance wiring, but aluminum remains common for bond pads and some layers.

Why it matters

Aluminum's easy processing — it can be etched directly, unlike copper — made early integrated circuits practical, and its maturity and reliability keep it in use for specific roles even in modern chips.

Beginner intuition

Metals are needed to wire devices together and to form the contact and bond pads a package connects to; aluminum was the first good fit because it sticks to oxide and is easy to pattern by etching.

Copper conducts better, but aluminum's simplicity and reliability mean it never fully went away — for example, it is common for the top bond pads.

Material properties

Electrical
A good conductor (higher resistivity than copper), adequate for many wiring roles.
Process (etchable)
Can be deposited and etched with standard processes — simpler than copper's damascene.
Reliability
Mature and well understood, though more prone to electromigration than copper in thin lines.

A note on properties

Aluminum's real-world resistivity and electromigration behaviour depend on alloying, line size, and processing; no single figure is asserted here.

Where it is used

  • Bond pads that packages connect to
  • Interconnect in mature/robust processes and some layers
  • Where simple, reliable metallization is preferred

Manufacturing process connection

Aluminum is deposited (often by PVD) and patterned by etching — a simpler flow than copper damascene — which is part of its enduring appeal for certain layers.

Equipment connection

Common issues

Performance implications

Aluminum illustrates process-driven choice: an easily etched metal (property/process) forms wiring and pads (device structure) with mature reliability (performance) — chosen where simplicity beats copper's lower resistance.

Packaging connection

Aluminum bond pads are a common interface between the die and the package's wire bonds.

Packaging →

Alternatives & material selection

Aluminum vs copper is a classic trade-off: copper for dense, fast wiring; aluminum for easy processing, pads, and robustness. Neither is universally better.

Copper
Lower resistance for dense, high-performance interconnect.
Tungsten
For contact and via plugs.
Advanced & research

Emerging and research directions, beyond today’s established practice.

  • ESTABLISHEDAluminum for power and specialty devices
  • ESTABLISHEDElectromigration mitigation by alloying
  • ESTABLISHEDLegacy-node metallization