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Chip Manufacturing · Topic 5 of 16

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Chip ManufacturingLesson 5 of 16

Deposition

Adding thin films of conductors, insulators, and semiconductors layer by layer.

What you’ll learn

  • CVD, PVD, and ALD
  • Why film control matters
  • Typical deposited materials

Why it matters

Chips are built up from dozens of precisely deposited thin films.

Explanation

Deposition adds material onto the wafer. Chemical vapour deposition (CVD) grows films from reactive gases; physical vapour deposition (PVD/sputtering) knocks atoms from a target onto the wafer; atomic layer deposition (ALD) builds films one atomic layer at a time for ultimate control.

Films must be uniform, conformal, and defect-free across the wafer.

Visual explanation

Gas precursors reacting at the wafer surface (CVD) beside atoms sputtered from a target (PVD).

Key terminology

CVD
Chemical vapour deposition.
PVD
Physical vapour deposition (sputtering/evaporation).
ALD
Atomic layer deposition — one monolayer per cycle.

Example

ALD deposits ultrathin high-k gate dielectrics with sub-nanometre thickness control.

Common mistakes

Real-world application

Advanced logic uses ALD extensively for the thinnest, most critical films.

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Deposition

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Photoresist

Chip Manufacturing

A light-sensitive coating that records the pattern to be etched.

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