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Gate-all-around transistors

Nanosheet transistors succeeding the FinFET.

Gate-all-around (GAA) nanosheet transistors wrap the gate fully around the channel for better electrostatic control at scaled dimensions. Research addresses channel engineering, contact resistance, and stacked complementary FET (CFET) devices.

Technologies

Gate-all-around (GAA)NanosheetCFET

Devices

MOSFETLogic transistor

Materials

SiliconHigh-κ dielectric

Applications

Advanced logic

Active research directions

  • Nanosheet channel engineering
  • Contact resistance at scale
  • CFET stacking

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