EUV lithography
Extreme-ultraviolet patterning and its extension to High-NA.
EUV (13.5 nm) lithography enables the smallest features in advanced logic and memory. Research focuses on extending resolution with High-NA optics, improving photoresist performance, and cutting cost and defectivity per wafer.
Technologies
EUVHigh-NA EUVComputational lithographyMulti-patterning
Devices
Advanced logicDRAM
Materials
EUV photoresistPellicleReticle
Applications
Advanced logicMemory
Active research directions
- Extending High-NA EUV
- Resist resolution vs line-edge roughness
- Throughput and cost per wafer