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Semiconductor Fundamentals · Topic 6 of 13

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Semiconductor FundamentalsLesson 6 of 13

Doping

Adding trace impurities to control a semiconductor's carrier type and concentration.

What you’ll learn

  • What doping does
  • Donors vs acceptors
  • How doping level sets conductivity

Why it matters

Doping is the single most important tool for turning inert silicon into working devices.

Explanation

Doping introduces small, controlled amounts of impurity atoms into the lattice. Donor atoms (e.g. phosphorus) add extra electrons; acceptor atoms (e.g. boron) add holes. Even parts-per-million doping changes conductivity by orders of magnitude.

By choosing the dopant and its concentration, engineers set whether a region is electron-rich (n-type) or hole-rich (p-type), and how strongly it conducts.

Visual explanation

n-type (donor)Pfree e⁻p-type (acceptor)Bhole
A silicon lattice with a phosphorus atom contributing a spare electron, and a boron atom creating a hole.

Key terminology

Dopant
An impurity added to change carrier concentration.
Donor
A dopant that donates a free electron (n-type).
Acceptor
A dopant that accepts an electron, creating a hole (p-type).

Example

Adding phosphorus to silicon makes it n-type; adding boron makes it p-type — the basis of every junction.

Common mistakes

Real-world application

Ion implantation places precise dopant doses exactly where transistors need them.

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Doping

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n-type semiconductor

Semiconductor Fundamentals

Silicon doped with donors, where electrons are the majority carriers.

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